Cost-effective method produces semiconducting films from materials that outperform silicon.
The vast majority of computing devices today are made from silicon, the second most abundant element on Earth, after oxygen. Silicon can be found in various forms in rocks, clay, sand, and soil. And while it is not the best semiconducting material that exists on the planet, it is by far the most readily available. As such, silicon is the dominant material used in most electronic devices, including sensors, solar cells, and the integrated circuits within our computers and smartphones.
Now MIT engineers have developed a technique to fabricate ultrathin semiconducting films made from a host of exotic materials other than silicon. To demonstrate their technique, the researchers fabricated flexible films made from gallium arsenide, gallium nitride, and lithium fluoride — materials that exhibit better performance than silicon but until now have been prohibitively expensive to produce in functional devices.
The new technique, researchers say, provides a cost-effective method to fabricate flexible electronics made from any combination of semiconducting elements, that could perform better than current silicon-based devices.
“We’ve opened up a way to make flexible electronics with so many different material systems, other than silicon,” says Jeehwan Kim, the Class of 1947 Career Development Associate Professor in the departments of Mechanical Engineering and Materials Science and Engineering. Kim envisions the technique can be used to manufacture low-cost, high-performance devices such as flexible solar cells, and wearable computers and sensors.
Details of the new technique are reported today in Nature Materials. In addition to Kim, the paper’s MIT co-authors include Wei Kong, Huashan Li, Kuan Qiao, Yunjo Kim, Kyusang Lee, Doyoon Lee, Tom Osadchy, Richard Molnar, Yang Yu, Sang-hoon Bae, Yang Shao-Horn, and Jeffrey Grossman, along with researchers from Sun Yat-Sen University, the University of Virginia, the University of Texas at Dallas, the U.S. Naval Research Laboratory, Ohio State University, and Georgia Tech.
Now you see it, now you don’t
In 2017, Kim and his colleagues devised a method to produce “copies” of expensive semiconducting materials using graphene — an atomically thin sheet of carbon atoms arranged in a hexagonal, chicken-wire pattern. They found that when they stacked graphene on top of a pure, expensive wafer of semiconducting material such as gallium arsenide, then flowed atoms of gallium and arsenide over the stack, the atoms appeared to interact in some way with the underlying atomic layer as if the intermediate graphene were invisible or transparent. As a result, the atoms assembled into the precise, single-crystalline pattern of the underlying semiconducting wafer, forming an exact copy that could then easily be peeled away from the graphene layer.
The technique, which they call “remote epitaxy,” provided an affordable way to fabricate multiple films of gallium arsenide, using just one expensive underlying wafer.
Soon after they reported their first results, the team wondered whether their technique could be used to copy other semiconducting materials. They tried applying remote epitaxy to silicon, and also germanium — two inexpensive semiconductors — but found that when they flowed these atoms over graphene they failed to interact with their respective underlying layers. It was as if graphene, previously transparent, became suddenly opaque, preventing atoms of silicon and germanium from “seeing” the atoms on the other side.
thumbnail courtesy of mit.edu