Interest in microscale 3D lithography continues to grow with the development of new
tools and new patterning materials. To date most available materials are rigid, glassy
systems derived from stereolithography studies.
Soft materials lack the same level of
sophistication, but there is a drive to improve this situation with the introduction of new
elastomers and hydrogels. A general strategy is lacking for these 3D patterning systems as
there is for the production of chemically amplified photoresists. This paper describes both
positive and negative tone chemically amplified 3D materials as well and photocured
systems based on radical and cationic crosslinking systems.
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